Introduction of PVD Vacuum Coating

2019-05-30

A.The Meaning of PVD

PVD is the abbreviation of Physical Vapor Deposition in English, which means "physical vapor deposition" in Chinese. It refers to the preparation technology of thin films deposited on the plated workpiece by physical method under vacuum conditions.


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B.PVD Coating Machine and PVD Coating Machine

PVD (Physical Vapor Deposition) coating technology is mainly divided into three categories: vacuum evaporation coating, vacuum sputtering coating and vacuum ion coating. Corresponding to the three classifications of PVD technology, the corresponding vacuum plating equipment includes vacuum evaporation plating machine, vacuum sputtering plating machine and vacuum ion plating machine. In recent ten years, the development of vacuum ion plating technology is the fastest, and it has become one of the most advanced surface treatment methods. What we usually call PVD coating is vacuum ion coating; what we usually call PVD coating machine is vacuum ion coating machine.


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C.Principle of PVD Coating Technology

The principle of PVD (ion plating) technology is to use low voltage and high current arc discharge technology to evaporate the target material and ionize the evaporated material and gas under vacuum conditions. The evaporated material and its reaction products are deposited on the workpiece by the acceleration of electric field.


D.Characteristics of PVD Coating

The coatings deposited by PVD technology have the characteristics of high hardness, high wear resistance (low friction coefficient), good corrosion resistance and chemical stability, and the service life of the coatings is longer. At the same time, the coatings can greatly improve the decorative performance of the workpiece.


E.Types of coatings that can be deposited by PVD coating

PVD coating technology is a kind of environmentally friendly surface treatment method which can truly obtain micron-scale coatings without pollution. It can prepare a variety of single metal films (such as aluminum, titanium, zirconium, chromium, etc.), nitride films (TiN, ZrN, CrN, TiAlN), carbide films (TiC, TiCN), and oxide films (such as titanium).


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