Brief Introduction of Electron Beam Evaporation

Electron beam evaporation is a kind of physical vapor deposition.Different from traditional evaporation methods,electron beam evaporation can accurately bombard the crucible target with high energy electrons,melt it and deposit it on the substrate by using electromagnetic field. Electron beam evaporation can deposit high purity and high precision thin films.

Evaporation principle

Electron beam evaporation (EBV) is a method of accelerating electron bombardment on coated materials. The kinetic energy of electrons is converted into heat energy to make the coated materials evaporate and form films. Electronic guns can be divided into direct-fire,ring and E-type.The characteristic of electron beam heating evaporation is that it can obtain extremely high energy density up to 109 w/cm2,heating temperature up to 3000-6000℃, which can evaporate refractory metals or compounds; the evaporated material placed in a water-cooled crucible can avoid the contamination of crucible material and prepare high-purity thin films; in addition, because of the small heating area of evaporator, the heat radiation loss is reduced and the thermal efficiency is high. However, because of the complex structure and the possibility of decomposition by bombardment of electrons, it is not suitable for the evaporation of most compounds.

Effect

Electron beam evaporation is often used to prepare Al, CO, Ni, Fe alloy or oxide films, SiO2, ZrO2 films, corrosion resistance and high temperature oxidation films.

Comparison of advantages and disadvantages

The greatest advantage of electron beam evaporation and resistance evaporation is that it can provide higher heat for the material to be evaporated, so the rate of evaporation is faster. The accurate positioning of electron beam can avoid the evaporation and pollution of crucible material. However, due to the need for continuous water cooling in the process of evaporation, the utilization rate of energy is not high, and secondary electrons brought by high-energy electrons may ionize the residual gas molecules, and may also cause pollution.In addition, most of the compound films decompose when bombarded by high-energy electrons, which affects the composition and structure of the films.

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