Application introduction of Aluminum Oxide

Aluminum Oxide, molecular weight 101.96, density 3.97g/cm3, melting point 2045 ℃, boiling point 3500 ℃, evaporation temperature 1550 ℃ in 10-2Pa vacuum. It can be heated and evaporated by tungsten or molybdenum boat, and easily decomposed into absorption film. It does not decompose when heated by an electron beam. It is a non absorption film in the wavelength range of 230 nm ~ 2 μ m, and very small in the range of 2.7 μ m ~ 3.6 μ M. The transparent region of Al2O3 film is 0.2 ~ 8 μ M. The refractive index is related to the substrate temperature, n = 1.53 ~ 1.60 (λ = 550nm) at room temperature and 1.60 ~ 1.64 (λ = 550nm) at 300 ℃. The refractive index of Al2O3 thin films prepared by reactive sputtering is n = 1.78 in the visible region. The mechanical properties of Al2O3 thin films are very strong, even when the films grow to micron thickness, they are strong enough. It is insoluble in water and only slightly corrosive to acid. At present, the methods of producing alumina films are electron beam evaporation, RF sputtering, reactive DC sputtering or reactive evaporation.

Aluminum Oxide is a kind of medium-index material which is widely used in semiconductor barrier layer, optics and microelectronics, also be suitable for application in UV through IR spectrum. It can be used in anti-reflection coatings, dielectric mirror, multi-layer filter, interference coatings, protective coatings, etc.

In 2007, ATS began to produce Al2O3. Main specification: crystal granules, sintered tablet. Color transparent and white in purity 99.99%. The commonly used size is 1-3mm crystal granules, and other sizes can be customized.