Advantages and disadvantages of different evaporation sources

Resistance heating evaporation source

Advantages:

1. It has a simple structure, is convenient to use, and has low production cost, so it is widely used;

2. It can evaporate aluminum, gold, silver and other metals whose evaporation temperature is less than 1500℃, and evaporate some sulfides, fluorides and some oxides.

Request:

1. The melting point of the evaporation source material should be high;

2. The saturated vapor pressure should be low;

3. The chemical properties should be stable and have good heat resistance. When the heat source changes, the power density changes little;

4. The evaporation source has good "wettability" of the film material.

Electron beam heating evaporation source

Advantages:

1. Compared with resistance heating source, it can reduce pollution;

2. The energy is concentrated, so that the surface of the film material is subject to high temperature, while the temperature of other parts is low. Therefore, materials with high melting point (up to 3000°C) can be evaporated, and the evaporation rate is high;

3. It can accurately and conveniently control the evaporation temperature;

4. It has a large temperature adjustment range and is suitable for both high and low melting point film materials. It has wide applicability and is especially suitable for vapor deposition of oxides with a melting point as high as 2000°C.

Disadvantages:

1. The deposited film is usually thin;

2. The composition of the deposited film is complex.

Laser evaporation source

Advantages:

1. It can evaporate any high melting point material, various materials, It also can obtain high evaporation rate;

2. Compared with the resistance heating evaporation source, it can reduce the pollution of the coating;

3. It is very suitable for evaporating compounds or alloys;

4. Compared with electron beam evaporation source, it avoids the shortcomings of electron beam evaporation film surface charging.

Disadvantages:

1. Working for a long time, the lens where the laser enters the bell jar window will be affected;

2. Laser evaporator is very expensive, and not all materials can show its superiority;

3. Because the temperature of the evaporation material is too high, the evaporated particles (atoms, molecules, clusters, etc.) are more likely to be ionized, which will have a certain impact on the membrane structure and characteristics.

High frequency induction evaporation source

Advantages:

1. It is surface evaporation, the evaporation rate is large, it can be about 10 times larger than the resistance evaporation source;

2. The temperature of the evaporation source is uniform and stable, and splashing is not easy to occur;

3. The evaporation source is charged at one time, no feeding mechanism is needed, temperature control is relatively easy, and the operation is relatively simple.

Disadvantages:

1. Because contact easily causes pollution;

2. Only conductive film material can be evaporated;

The equipment must be shielded, and complex and expensive high-frequency generators are required.